发明名称 |
Substrate spin treating apparatus |
摘要 |
A substrate treating apparatus for performing a predetermined treatment of a substrate in a spin, has a spin motor including a rotor having a hollow opening centrally thereof, and a stator disposed coaxially with the rotor and having a hollow opening centrally thereof. The rotor includes holders for supporting the substrate in three peripheral positions thereof. A support mechanism switches the holders between a position for supporting the substrate, and a position retracted therefrom. The opposite surfaces of the substrate supported by the holders are cleaned with a cleaning solution supplied through nozzles. The holders have a substrate supporting force derived from a weight and magnetism of the support mechanism, to support the substrate reliably. A guide is disposed in the hollow of the rotor, and connected to the rotor. The holders are arranged in a substrate treating space formed inwardly of the guide. The holders are arranged on the guide. Thus, the spin motor is protected from exposure to a treating solution atmosphere.
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申请公布号 |
US5916366(A) |
申请公布日期 |
1999.06.29 |
申请号 |
US19970944229 |
申请日期 |
1997.10.06 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
UEYAMA, TSUTOMU;IZUMI, AKIRA;ADACHI, HIDEKI |
分类号 |
B05C11/08;B08B11/02;G03F7/16;H01L21/00;H01L21/687;(IPC1-7):B05C5/00 |
主分类号 |
B05C11/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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