Positive resist composition

摘要

A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises (A) a resin which is converted to alkali-soluble from alkali-insoluble or alkali-slightly soluble by the action of an acid, (B) an acid generator and (C) a tertiary amine compound having an aliphatic hydroxyl group.