发明名称 WATER BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF COPPER COATINGS
摘要 A water deposition bath is used for homogeneous electrolytic deposition of copper coatings, more particularly, on printed boards. Said bath contains at least one copper ion source, at least one compound enhancing the electric conductivity of the deposition bath and at least one additive. The additive contains at least one conversion product, formed by epihalogenohydrins, dihalogenohydrins or 1-halogen-2,3-propanediols and polyamidoamines. The polyamidoamines are formed by condensation reaction of dicarboxylic acids with polyalkylene polyamines. Copper coatings with homogenous coating thickness can be deposited using said bath.
申请公布号 WO9931300(A2) 申请公布日期 1999.06.24
申请号 WO1998DE03783 申请日期 1998.12.17
申请人 ATOTECH DEUTSCHLAND GMBH;DAHMS, WOLFGANG;JONAT, MICHAEL;SENGE, GERD;NITSCHE, DETLEV 发明人 DAHMS, WOLFGANG;JONAT, MICHAEL;SENGE, GERD;NITSCHE, DETLEV
分类号 C08G73/02;C25D3/38;C25D7/00 主分类号 C08G73/02
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