发明名称 Microwave plasma source
摘要 The microwave plasma source incorporating a plasma chamber with at least one nonmetal wall. The body forming the plasma chamber is fully accommodated in the vacuum chamber. Thus the chamber is subjected to the substantially same pressure conditions from all sides, and there is a distance between the plasma chamber and the sealing system of the vacuum chamber.
申请公布号 DE19756774(A1) 申请公布日期 1999.06.24
申请号 DE19971056774 申请日期 1997.12.19
申请人 TEC TRA GMBH, 60323 FRANKFURT, DE 发明人
分类号 H01J37/32;H05H1/46;(IPC1-7):H05H1/46;C23F4/00 主分类号 H01J37/32
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