METHOD AND APPARATUS FOR CONTROLLED PARTICLE DEPOSITION ON WAFERS,申请号EP19950923984-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR CONTROLLED PARTICLE DEPOSITION ON WAFERS
摘要
申请公布号	EP0766604(A4)	申请公布日期	1999.06.23
申请号	EP19950923984	申请日期	1995.06.19
申请人	MSP CORPORATION	发明人	LIU, BENJAMIN Y.H.
分类号	B05D1/06;B05B5/08;B05B12/02;B05C11/00;B05D1/12;H01L21/00;H01L21/316;(IPC1-7):B05D1/12;B05D1/04;B05C11/02	主分类号	B05D1/06
代理机构		代理人
主权项
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