POSITIVE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive photoresist composition having solved problems on troubles during the elapse of time after exposure until heat treatment and enhanced in sensitivity and resolution and capable of obtaining a superior resist pattern free of cracking of the resist pattern. SOLUTION: This composition comprises a resin having groups increasing solubility in an alkaline developing solution by decomposition due to action of an acid and a mixture of a photo-acid-generator (B-1) high in effect of lowering dissolution speed in an alkaline developing solution and a photo-acid- generator (B-2) small in effect of lowering the dissolution speed of an exposed part as compared with (B-1).