发明名称 PELLICLE FOR LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To make it possible to suppress the reflection of light and to surely and easily inspect the foreign matter on the surface a pellicle film by providing the surface of an adhesive layer with the pellicle film having the brightness of a specific end face. SOLUTION: The top end face of a pellicle frame 1 is stretched and provided with the pellicle film 2 via the adhesive layer. Ordinarily a tacky adhesive layer 3 is further formed in the lower part of the pellicle frame 1 and a peelable release layer 4 is affixed to the bottom end face thereof. The characteristic of the pellicle to be used is 0 to 60 in the brightness at the end face of the pellicle 2 existing on the adhesive layer when the brightness is measured by a method stipulated in JIS(Japanese Industrial Standards) Z 8741-43 by using rays of a wavelength 400 to 1,100 nm; As a result, at the time of inspecting the foreign matter on the pellicle film 2 by illumination with a halogen lamp, etc., the reflected light from the end face of the pellicle film 2 decreases and, therefore, the sure and easy inspection even in the extreme proximity of the pellicle frame 1 is possible. The material of the pellicle frame 1 includes the anodic oxidation treated material of an aluminum material, stainless steel, polyacetal, etc.
申请公布号 JPH11167196(A) 申请公布日期 1999.06.22
申请号 JP19970332558 申请日期 1997.12.03
申请人 SHIN ETSU CHEM CO LTD 发明人 NAGATA AKIHIKO
分类号 G03F1/62;H01L21/027 主分类号 G03F1/62
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