| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain at high speed and with high precision mask data for which optical proximity effect correction is performed. SOLUTION: This mask data design method though which a design pattern is corrected and used as mask data is provided with a process, in which a line segment to be corrected is extracted from the design pattern, a process where the extracted line segment is divided into a length suitable for correction, a process where classification into a one-dimensional pattern and a two-dimensional pattern is performed by discriminating whether the feature of spatial arrangement of the divided line segment can be approximated by a one-dimensional rule, and a process where correction is performed corresponding to the kind of the classified pattern. When the arrangement of the divided line segment is a one-dimensional pattern, arrangement in a specified distance which is viewed in a direction perpendicular from the divided line segment is subjected to one-dimensional process simulation, and a correction value is obtained (S8). When the arrangement of the divided line segment is a two-dimensional pattern, a pattern which is contained in a rectangular region shaving a specified distance in the perpendicular direction and the horizontal direction from one point on the divided line segment is extracted two-dimensionally, the extracted pattern is subjected to two-dimensional process simulation, and a correction value is obtained (S13).</p> |
