| 摘要 |
A phase shifting mask and manufacturing method therefor has an improved step coverage by forming a shielding layer pattern by way of a phase shifting layer. The phase shifting mask includes an optically transmitting substrate, and a transmitting pattern and a non-transmitting pattern formed onto the substrate, in which the transmitting pattern has a linewidth more than a limit resolution with respect to an exposure light, and the non-transmitting pattern has a line width below the limit resolution with respect to the exposure light.
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