发明名称 |
Ventilation hood with enhanced particle control and method of using |
摘要 |
An apparatus for cleaning a process chamber that includes a ventilation hood which has a fluid flow channel attached to an inner peripheral wall of the hood body equipped with a plurality of fluid nozzles pointing downwardly toward a process chamber cavity when the hood is positioned on such process chamber, and a method for using the apparatus. A purge gas flown through the fluid nozzles carries substantially all contaminating fumes or particles away from the process chamber cavity into an air evacuation system such as a factory vacuum exhaust system such that contamination of the process chamber can be essentially eliminated.
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申请公布号 |
US5913721(A) |
申请公布日期 |
1999.06.22 |
申请号 |
US19980055379 |
申请日期 |
1998.04.06 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD. |
发明人 |
TENG, KUO HSIU |
分类号 |
B08B9/093;B08B15/02;C23C16/44;H01L21/00;(IPC1-7):B08B15/02 |
主分类号 |
B08B9/093 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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