发明名称 X-ray microbeam generating method and device for the same
摘要 A method of generating an X-ray microbeam of the present invention generates an X-ray microbeam having a restricted divergence angle and desirable planeness in regions other than the focus. With this method, it is possible to compensate for a change in the degree of asymmetry ascriable to a change in the wavelength of X-rays selected, and therefore to maintain the degree of asymmetry constant. In addition, the condensing conditions including the energy of X-rays and beam size each can be set independently of the others. A device for practicing the above method is also disclosed.
申请公布号 US5914998(A) 申请公布日期 1999.06.22
申请号 US19970936384 申请日期 1997.09.25
申请人 NEC CORPORATION 发明人 IZUMI, KOICHI
分类号 G21K1/06;H05G2/00;(IPC1-7):G21K1/06 主分类号 G21K1/06
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