发明名称 CHARGED PARTICLE BEAM OPTICAL ELEMENT, EXPOSURE DEVICE THEREOF, AND ITS ADJUSTMENT
摘要 PROBLEM TO BE SOLVED: To prevent aberration from remarkably enlarging even if a field size is widened, and enable formation of a highly precise and fast pattern. SOLUTION: With regard to a cylindrical coordinate system defined in (r, z,θ) in which two electrodes 1, 2 are separated from each other, oppositely disposed, an electronic beam passes between the electrodes 1, 2 and an optical element functions as an electronic lens for converging the beam, the opposite face of each electrode 1, 2 is formed in cylindrical symmetry along the direction passing the beam respectively, so that an electric field in which an effective part except for the arbitrary constant of an electric field potential is given byϕ=(k/2)r<2> -αlnr-kz<2> (k, d= arbitrary constant respectively) is spatially formed in a part, and formed so as to be a curve deforming a hyperbolic in the direction orthogonal to the direction passing the beam.
申请公布号 JPH11160495(A) 申请公布日期 1999.06.18
申请号 JP19970337331 申请日期 1997.12.08
申请人 TOSHIBA CORP 发明人 MUROOKA KENICHI;OGASAWARA MUNEHIRO;SUNAOSHI HITOSHI
分类号 G21K1/087;G21K1/093;H01J3/18;H01J37/12;H01J37/14;H01J37/305;H01L21/027;(IPC1-7):G21K1/087 主分类号 G21K1/087
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