发明名称 APPARATUS FOR CAPTURING SEMICONDUCTOR CONTAMINANT SUBSTANCE
摘要 PROBLEM TO BE SOLVED: To analyze a contaminant substance with high sensitivity by efficiently capturing only a contaminant to be a problem in a semiconductor industry in an apparatus for capturing a semiconductor contaminant substance contained in a clean room air. SOLUTION: Silicon powder 3 comminuted to 100 to 500μm is charged in a quartz tube 2. When a pump 4 is driven, the air is sucked from an air suction port 1. At this time, an ester compound, siloxane compound or the like is adsorbed to the powder. And, the compound which does not become a problem in a semiconductor industry is not adsorbed, but discharged together with the air. Thereafter, the tube is heated by a heater, and the substance is introduced to a cold trap. This is cooled by liquid nitrogen, then abruptly heated by a high frequency wave, and hence the substance is introduced to a separation column of a gas chromatograph.
申请公布号 JPH11160299(A) 申请公布日期 1999.06.18
申请号 JP19970328078 申请日期 1997.11.28
申请人 SEIKO EPSON CORP 发明人 MURAKAMI HIROAKI
分类号 G01N30/08;(IPC1-7):G01N30/08 主分类号 G01N30/08
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