| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask manufacturing member, masks and a method for manufacturing them, in which the deflection of a membrane due to a compression stress and deformation of a pattern due to a stretch stress are suppressed or dissolved. SOLUTION: In this mask manufacturing member, in a mask membrane 7' in which a pattern to be transferred to a sensitive substrate is formed is supported by a support member H, the membrane 7' is formed by a silicon thin film, and an impurity element having an atomic radius smaller than that of silicon is diffused in the silicon thin film. |
