| 摘要 |
PROBLEM TO BE SOLVED: To provide the manufacture of the color filter which is free of a residue to an adjacent pixel and color mixture. SOLUTION: This manufacture of a color filter has a process for forming a pixel section film 1 of specific BM, etc., on a light-transmissive substrate 2, forming photosensitive resin colored layers 3a-1, 19, and 15, arranging a mask 17 having a specific opening part on the opposite surface of the light- transmissive substrate 2 from the surface where the pixel section film 1 is formed, irradiating the photosensitive resin colored layers 3a-1, 19, and 15 with an active light beam from the reverse surface of the light-transmissive substrate 2 through the mask opening part, and forming specific pixels through development is performed a specific number of times and the γ value of the photosensitive resin is 70 to 90 deg.. Consequently, the color filter is insensitive to light traveling round to below a photomask light shield part owing to the diffraction of the light and the occurrence of a residue to an adjacent pixel can be prevented. |
