| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate treatment equipment which enables cleaning treatment of a water introducing path which introduces water to a specified portion of a treatment part at any time. SOLUTION: A pure water supply piping system of a substrate treatment equipment 10 is linked with a water supply piping path 51 in a factory via a linkage pipe 1, and a drain piping system is linked with a waste liquid piping path 52 via a linkage pipe 5. A cleaning liquid supply tube 3 connected with a cleaning liquid supplying source is connected with a branch part 1a of the linkage pipe 1, and a cleaning liquid discharge tube 7 for discharging cleaning liquid to the outside is connected with a branch part 5a of the linkage piping 5. The cleaning liquid supply in tube 3 sends the cleaning liquid to the inside of the pure water supply pipe system, which is cleaned. A cleaning liquid discharge tube 7 discharges the cleaning liquid introduced in the drain piping system to the outside. |
