发明名称 COMPOUND SEMICONDUCTOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor substrate where plural formation, composite formation, and high level integration of elements are enabled by preventing deterioration of characteristics of an electric device such as a MESFET and a HEMT and deterioration of an optical device such as an LED and an LD, and making element isolation of the above devices sure. SOLUTION: In a compound semiconductor substrate, a compound semiconductor layer composed of group III-V elements in a periodic table is continuously epitaxially grown on a substrate composed of group IV single element in a periodic table. The above compound semiconductor layer contains at least one kind of element out of group II or IV or VI elements in a periodic table, so that a gradient whose atomic concentration on the interface side with the above substrate is at least 1&times;10<17> atoms.cm<-3> , and atomic concentration on the surface side is at most 1&times;10<17> atoms.cm<-3> .
申请公布号 JPH11163399(A) 申请公布日期 1999.06.18
申请号 JP19970324968 申请日期 1997.11.26
申请人 KYOCERA CORP 发明人 HIGUCHI HISASHI
分类号 H01L21/205;H01L33/16;H01L33/30;H01L33/34;H01S5/00;H01S5/323 主分类号 H01L21/205
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