发明名称 ELECTROSTATIC CHUCK
摘要 PROBLEM TO BE SOLVED: To enhance a film forming accuracy or an etching accuracy for a fixed body by using a nitriding aluminum sintered material the volume intrinsic resistance of a specific temperature domain of which stays within a specified range. SOLUTION: This electrostatic chuck 1 is suck that a main face of a discoidal ceramic body 2 is set as a connecting face 3 with a body W to be fixed, and a discoidal electrode 4 for an electrostatic sucking is embedded in the ceramic body 2. The ceramic body 2 has a dielectric constant higher than or equal to 13 and is formed by a nitriding aluminum sintered material the volume intrinsic resistance under 200 deg.C of which stays in a range equal to or more than 10<9> &Omega;.cm and less than 10<12> &Omega;.cm. By applying a voltage between the body W installed on the connecting face 3 and the electrode 4 for the electrostatic sucking embedded in the ceramic body 2, an sucking force of Johnson-Rahbeck effect is generated in a temperature atmosphere equal to or below 200 deg.C, and the body W can be held firmly.
申请公布号 JPH11163112(A) 申请公布日期 1999.06.18
申请号 JP19970329336 申请日期 1997.11.28
申请人 KYOCERA CORP 发明人 MIKAMI KAZUHIKO;AIDA HIROSHI;ITOU YUMIKO
分类号 B23Q3/15;C04B35/581;H01L21/68;H01L21/683;H02N13/00 主分类号 B23Q3/15
代理机构 代理人
主权项
地址
您可能感兴趣的专利