发明名称 |
SURFACE MODIFICATION OF SEMICONDUCTORS USING ELECTROMAGNETIC RADIATION |
摘要 |
Deposition rates of undoped silicate glass dielectric layers on thermal oxide are increased by pre-treating the thermal oxide layer with electromagnetic radiation (126) in the ultraviolet (UV) and/or vacuum ultraviolet (VUV) wavelengths. The surface smoothness of the resulting films are also increased by pre-treating films with UV and/or VUV radiation. Furthermore, the gap filling abilities of the undoped silicate glass films are increased by pre-treating the thermal oxide with UV and/or VUV radiation. New equipment (100) and methods are presented for exposing semiconductor devices (112) to UV and/or VUV radiation, and for enhancing the deposition rates and film quality for semiconductor manufacture. Semiconductor devices incorporating the new methods are also described.
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申请公布号 |
WO9930353(A1) |
申请公布日期 |
1999.06.17 |
申请号 |
WO1998US24998 |
申请日期 |
1998.11.19 |
申请人 |
QUESTER TECHNOLOGY, INC. |
发明人 |
KHAN, ASHRAF, R.;RAMANATHAN, SASANGAN;FOGGIATO, GIOVANNI, ANTONIO |
分类号 |
H01L21/76;C23C16/02;H01L21/304;H01L21/31;H01L21/316;H01L21/762;H01L21/768;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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