发明名称 Sputtering cathode for production of thin layers on substrates in a vacuum chamber
摘要 The cathode (3, 4) has a target (25, 26) and a magnet yoke (11, 12) which holds the target and is provided with a channel (9, 10) for target cooling. Pipe segments (15, 16) connect the magnet yoke to the vacuum chamber wall (5) and also serve for coolant supply and removal respectively to and from the pipe pairs (7, 7', 8, 8') in the channels (9, 10).
申请公布号 DE19755448(A1) 申请公布日期 1999.06.17
申请号 DE19971055448 申请日期 1997.12.13
申请人 LEYBOLD SYSTEMS GMBH, 63450 HANAU, DE 发明人 SAUER, ANDREAS, 63768 HOESBACH, DE;SCHUHMACHER, MANFRED, 63755 ALZENAU, DE
分类号 C23C14/34;H01J37/34;(IPC1-7):H01J37/34 主分类号 C23C14/34
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