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发明名称
PHOTORESIST COATING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES
摘要
申请公布号
KR200149836(Y1)
申请公布日期
1999.06.15
申请号
KR19960032455U
申请日期
1996.10.01
申请人
HYUNDAI MICRO ELECTRONICS CO., LTD.
发明人
HAN, JUNG-KYU
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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