| 摘要 |
PROBLEM TO BE SOLVED: To efficiently form a film minimal in the occurrence of abnormal electric discharge during DC sputtering over a long period and having excellent properties by providing a composition containing boron in a specific atomic percentage and composed essentially of a compound oxide of zinc and boron. SOLUTION: The ZnO sintered compact contains 1-9 atomic % boron. It is preferable that this ZnO sintered compact has >=4.8 g/cm<3> sintered density and 4-15 μm average crystalline grain size. Further, it is preferable to regulate the segregation diameter of boron and the maximum diameter of pores to <=10 μm and 5 μm, respectively. It is preferable that a green compact, obtained by compacting a raw material which is composed essentially of a composite powder prepared by calcining ZnO powder and B2 O3 powder or a composite powder prepared by calcining a hydroxide of ZnO-B2 O3 formed by a coprecipitation method, is sintered in an oxygen-containing atmosphere or in an oxygen-free atmosphere. In this way, the inexpensive ZnO sintered compact for sputtering target, excellent in productivity, can be obtained. |
