A GAS EXHAUST SYSTEM OF A SEMICONDUCTOR,申请号KR19960015844-传众专利搜索

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发明名称	A GAS EXHAUST SYSTEM OF A SEMICONDUCTOR
摘要
申请公布号	KR100195866(B1)	申请公布日期	1999.06.15
申请号	KR19960015844	申请日期	1996.05.13
申请人	SAMSUNG ELECTRONICS CO, LTD.	发明人	LEE, JONG-HAK
分类号	H01L21/265;(IPC1-7):H01L21/265	主分类号	H01L21/265
代理机构		代理人
主权项
地址

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