发明名称 HIGH-TRANSPARENCY SILICON OXIDE VAPOR DEPOSITED FILM
摘要 PROBLEM TO BE SOLVED: To provide a silicon oxide vapor deposited film being excellent in oxygen-barrier and water-vapor-barrier properties and having high transparency as a film for packaging food, pharmaceuticals, etc. SOLUTION: A high-transparency silicon oxide deposited film is obtained by providing a high-oxidation silicon oxide layer 20 of an oxidation degree 1.8 or above and a thickness 100-500Åon at least one surface of a base 10 constituted of a plastic film, by a dry coating method such as a vacuum evaporation method, and by laminating a low-oxidation silicon oxide layer 30 of an oxidation degree 1.0-1.6 and a thickness 10-50Åon the high-oxidation silicon oxide layer 20. Besides, a silicon oxide coat 40 is formed on the low-oxidation silicon oxide layer 30 by a sol-gel process.
申请公布号 JPH11156989(A) 申请公布日期 1999.06.15
申请号 JP19970327303 申请日期 1997.11.28
申请人 TOPPAN PRINTING CO LTD 发明人 MANIWA SUSUMU;YAMAMOTO KYOICHI;MIYAMOTO TAKASHI
分类号 C08J7/04;B32B9/00;(IPC1-7):B32B9/00 主分类号 C08J7/04
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