首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
METHOD FOR CONTACT ETCHING OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100200071(B1)
申请公布日期
1999.06.15
申请号
KR19960023334
申请日期
1996.06.24
申请人
SAMSUNG ELECTRONICS CO, LTD.
发明人
LEE, SOO-CHUN
分类号
H01L21/28;(IPC1-7):H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Low speed rotary mower
PHARMACEUTICAL COMPOSITION AND PRODUCTION THEREOF
Process and apparatus for the production of cardboard plates and the like
Pleuromutilin glycoside derivatives
Expandable 4 {33 {0 8 array multiplier
Directional relays
Method and apparatus for coupling facsimile signals to a telephone network
Gas component sensing apparatus
Versatile LDV burst simulator
Methods and means for identifying and testing circuit connections
Radiation hard memory cell and array thereof
Binary multiplier using identical memories or identical networks
Slot antenna
Travelling wave laser
Interchangeable tripping device for a circuit-breaker
Differential pressure threshold detector
Polyprenyl carboxylic acid compound and hypotensive agent containing it as active ingredient
Pesticidal 2,2-dimethyl-3-isobutyl-cyclopropionates
Block copolymer of poly(dioxa-amide) and polyamide
Preparation of polyester carbonates from polyanhydride ester intermediates