首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
APPARATUS AND METHOD FOR PROCESSING A RESIST
摘要
申请公布号
KR100196047(B1)
申请公布日期
1999.06.15
申请号
KR19950059477
申请日期
1995.12.27
申请人
TOKYO ELECTRON LIMITED
发明人
HASEBE, KEIZO;IINO, HIROYUKI;SEMBA, NORIO;KIMURA, YOSHIO
分类号
B01D19/00;G03F7/16;(IPC1-7):G03F7/26
主分类号
B01D19/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Polyphenylsulfone-polytetrafluoroethylene blend for anti-wear tapes in flexible oil pipes
Covalently bound monolayer for a protective carbon overcoat
Electrostatic abrasive particle coating apparatus and method
Jasmonic acid compounds in cocoa products
Use of lipid containing particles comprising Quillaja saponins for the treatment of cancer
Material for induction of hard tissue regeneration
Method of diagnosing and preventing pneumococcal diseases using pneumococcal neuraminidases
Conjugation of streptococcal capsular saccharides
Combinations of anti ErbB antibodies for the treatment of cancer
Methods and device to neutralize soluble toxic agents in the brain
Compositions comprising enzyme-cleavable opioid prodrugs and inhibitors thereof
Method of treating a mammalian teat and related compositions
Post-treatment method of carbon materials for improving the electrical conductivity and mechanical properties via dehydrocyclization reaction and polymer composite materials comprising the treated carbon materials
Sample container with sensor receptacle and methods of use
Copper alloy sheet, and method of producing copper alloy sheet
Curable resin composition and short-cure method
Conductive paste and electronic device and solar cell including an electrode formed using the conductive paste
Methods for manufacturing components from articles formed by additive-manufacturing processes
Plasma etching method, semiconductor device manufacturing method and computer-readable storage medium
Nano catalytic dewaxing of heavy petroleum wastes (>C-23 alkanes)
