DUAL CHAMBER PHOTORESIST COATING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES,申请号KR19960029044U-传众专利搜索

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发明名称	DUAL CHAMBER PHOTORESIST COATING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES
摘要
申请公布号	KR200146689(Y1)	申请公布日期	1999.06.15
申请号	KR19960029044U	申请日期	1996.09.12
申请人	HYUNDAI MICRO ELECTRONICS CO.,LTD.	发明人	LEE, HONG-KU
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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