| 摘要 |
The invention concerns compounds of formula (I) in which R1 represents a C7-C24 linear or branched, saturated or unsaturated alkyl radical; R2 represents a hydrogen atom or a methyl radical; M represents an alkaline or alkaline-earth metal, or a group of formula (a) in which R3, R4, R5 and R6, identical or different, represent a hydrogen atom, a C1-C6 alkyl radical or a C1-C6 hydroxyalkyl radical; m is a whole number between 1 and 5. The invention also concerns amino acids, amine salts and lactones of formula (II) derived from compounds of said formula (I). Said compounds are used as surfactants in particular for hygienic and cosmetic purposes.
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