发明名称 ELECTRON BEAM DEPOSITION DEVICE AND METHOD OF MANUFACTURING THIN FILM BY USING THE DEPOSITION DEVICE
摘要 An electron beam deposition device capable of manufacturing a high-quality deposited film, the method of manufacturing a deposited thin film by using the electron beam deposition device and a high quality compound thin film. The electron beam deposition device provided with at least one evaporation furnace, one electron gun and one arbitrary waveform signal generator, characterized in that the electron gun has a means of scanning with an electron beam two-dimensionally and, further, is so connected to receive signals outputted from the arbitrary waveform signal generator as electron beam scanning signal and/or electron beam intensity signals.
申请公布号 WO9927149(A1) 申请公布日期 1999.06.03
申请号 WO1998JP05234 申请日期 1998.11.20
申请人 TORAY INDUSTRIES, INC.;FUKUSHIMA, KAZUHIRO;NOMURA, FUMIYASU;TANOUE, TETSURO 发明人 FUKUSHIMA, KAZUHIRO;NOMURA, FUMIYASU;TANOUE, TETSURO
分类号 C23C14/24;C23C14/30;C23C14/54;(IPC1-7):C23C14/30;H01L21/88 主分类号 C23C14/24
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