发明名称 METHOD FOR EVALUATING RESISTANCE TO LASER
摘要 PROBLEM TO BE SOLVED: To evaluate resistance to a laser highly accurately by projecting light to a sample having a thin film, and simultaneously measuring an acoustic signal generated by a volume change of the sample as a result of absorption of light and a scattering signal when the light is projected. SOLUTION: A light from a light source 1 is shaped by a beam-shaping optical system 2, adjusted in quantity by a light quantity adjusting optical system 3, and separated to a reference light 15 and a measurement light 14 by a beam splitter 5. An intensity of a projection light is monitored with the use of the reference light 15 by a light quantity monitor sensor 8 and the measurement light 14 is shed to the sample 7. When the light is continuously projected to the sample 7 with the intensity monitored by the light quantity monitor sensor 8, generated acoustic signal and scattering signal are simultaneously measured respectively by an acoustic detection element 10 set to the sample 7 and a scattering light quantity monitor sensor 11 receiving the scattering light from the sample 7. A change of the acoustic signal and scattering signal to a count of projections at the constant intensity of the projection light is observed. Resistance to a laser can be evaluated from different view points according to this method.
申请公布号 JPH11148883(A) 申请公布日期 1999.06.02
申请号 JP19970314065 申请日期 1997.11.14
申请人 NIKON CORP 发明人 TANI HIROHISA
分类号 G01N25/72;G01M11/00;G01N21/00;G01N21/49;G01N29/00 主分类号 G01N25/72
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