发明名称 RADIATION SENSITIVE COMPOSITION FOR BLACK RESIST
摘要 PROBLEM TO BE SOLVED: To enhance film hardness and pattern surface smoothness and to restrain occurrence of residues and background stains on a nonexposed substrate by incorporating colorants comprising a mixture of a black pigment and a body pigment, an alkali-soluble resin, a polyfunctional monomer, and a photopolymer-ization initiator. SOLUTION: This radiation sensitive composition contains the colorants, for example, 100 pts.wt. of a carbon black and 300 pts.wt. of barium sulfate, as the alkali-soluble resin, for example, 50 pts.wt. of a copolymer of methacrylic acid, 2-hydroxyethyl methacrylate, benzyl methacrylate, and polystyrene macromonomer, further, as the polyfunctional monomer, for example, 40 pts.wt. of pentaerythritol hexaacrylate, as the photopolymerization initiator, for example, biimidazole derivative, and as a solvent, for example, 1500 pts.wt. of ethyl 3-ethoxypropionate and the composition is added and mixed to prepare a radiation sensitive liquid composition.
申请公布号 JPH11149153(A) 申请公布日期 1999.06.02
申请号 JP19970329643 申请日期 1997.11.14
申请人 JSR CORP 发明人 ABE SHIGERU;MIYAJI MASAAKI;NEMOTO HIROAKI
分类号 G03F7/004;C09D5/00;G02B5/00;G02B5/20;G02F1/1335;G03F7/027;G03F7/028 主分类号 G03F7/004
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