发明名称 ELECTRON BEAM INSPECTION METHOD AND APPARATUS THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To dispense with the scanning of electron beam because an inspection region is irradiated collectively and to inspect a sample without performing image addition from low magnification to high magnification. SOLUTION: A primary optical electronic beam irradiation part 11 emitting electron beam having a rectangular cross section from a linear cathode 12 to irradiate the inspection region 1a of a sample 16, a secondary optical image projection part 17 magnifying the image constituted by the secondary electrons and reflected electrons generated from the inspection region 1a by the irradiation with electron beam to predetermined magnification to form the magnified image on an electron beam detection part and the electron beam detection part 11 forming a detection signal on the basis of the formed image are provided and, herein, the primary optical electron beam irradiation part 11 forms electron beam so as to have an area almost the same as that of the inspection region 1a of the sample 16 to collectively irradiate the inspection region 1a.</p>
申请公布号 JPH11148905(A) 申请公布日期 1999.06.02
申请号 JP19970313205 申请日期 1997.11.14
申请人 TOSHIBA CORP 发明人 NAGAI TAKAMITSU;YAMAZAKI YUICHIRO;MIYOSHI MOTOSUKE
分类号 G01B15/00;G01N23/225;G01R31/302;H01J37/244;H01J37/26;H01J37/28;H01L21/66;(IPC1-7):G01N23/225 主分类号 G01B15/00
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