| 摘要 |
PROBLEM TO BE SOLVED: To accurately correct the variation in the image formation property by the absorption of energy of illumination light in a projective optical system, even in the case of performing double exposure while exchanging the reticle pattern for each wafer. SOLUTION: An operation of exposing the pattern of a first reticle under exposure condition A in the period TA, and exposing the pattern of a second reticle under exposure condition B in the period TB is repeated alternately The coefficient of expressing the model of the ripple of image formation property in the period TA and the coefficient of expressing the model of the ripple of the image formation property in the period TB are determined severally, according to the ratio of the quantity of application energy under exposure condition A to that under exposure condition B, and based on these coefficients, the quantityΔP of change of image formation property is forecast in each period TA and TB, and the image formation property is compensated so as to offset this quantityΔP of change.
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