TREATMENT APPARATUS AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide a treatment apparatus enhancing the quality and yield of a semiconductor. SOLUTION: A treatment apparatus 60 for applying a treatment soln. R to an object W to be treated through a pipe 64 has a treatment soln. supply part 61 storing the treatment soln. R to be applied to the object W to be treated, the nozzle 65 connected to the treatment soln. supply part 61 through the pipe 64 and dripping the treatment soln. R flowing from the treatment soln. supply part 61 to apply the same to the object W to be treated and the dust removing means 63 arranged to the pipe 64 between the treatment soln. supply part 61 and the nozzle 65 and having a filter part provided so as to come into contact with the treatment soln. positively charged to flow from the treatment soln. supply part 61.