| 摘要 |
PROBLEM TO BE SOLVED: To provide a scanning exposure type aligner which can reduce the unevenness in the quantity of exposure on a wafer when the coherence of illumination light is high. SOLUTION: A fly eye lens 31, where lens elements 31 a rectangular in cross section are arranged crosswise, is arranged within an illuminating optical system for illuminating a reticle, and the illumination light from many secondary light sources 23 made at the emission face of the fly eye lens 31 illuminates the illumination region 21 of a reticle superposedly. The longitudinal direction of the light and darkness of the interference fringes 24 made within the illumination region 21 on a reticle is inclined by an angleθto the direction (Y direction) of scanning, by inclining the direction of disposition of the lens elements of the fly eye lens 31 by the angleθfrom the direction corresponding to the direction of nonscanning in advance. Since each point relatively shifts in the pitch direction of the interference stripe 24 when each point on the reticle crosses the illumination region 21 at scanning exposure, the quantity of exposure is smoothed.
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