发明名称 METHOD AND APPARATUS FOR MAKING SURFACE STRUCTURE, ESPECIALLY HOLOGRAM SURFACE STRUCTURE ON BASE MATERIAL
摘要 <p>PROBLEM TO BE SOLVED: To facilitate the preparation of a hologram surface structure on a base material by a method in which a radiation curable substance, especially a radiation curable monomer, is applied on the base material, an embossed pattern is formed in the coating film, and the pattern is cured by modulated irradiation beams. SOLUTION: Foil or a film 4 coated with a radiation curable liquid monomer 5 is led to guide rollers 7, 7' and transferred along the surface of a rotary cylinder 10 in which surface structure 2, for example hologram surface structure, is formed on the outer surface of a cylinder surface 3. While the foil 4 is being contacted with the surface structure 2, an embossed pattern, namely the embossed pattern of the surface structure 2, is formed on the monomer coating film 5 of the foil 4. Subsequently, only a prescribed area of the embossed pattern is modulated by irradiation beams 1a, 1b emitted from the outside and inside of the rotary cylinder 10. In this way, the monomer on the foil 4 is cured to obtain the foil 4 with the cured monomer 6.</p>
申请公布号 JPH11147059(A) 申请公布日期 1999.06.02
申请号 JP19980220376 申请日期 1998.08.04
申请人 HSM HOLOGRAPHIC SYST MUENCHEN GMBH 发明人 DE JONGH RUDI;PODRATZKI BERNHARD
分类号 G03F1/88;B05C1/08;B05D1/28;B05D7/24;B29C39/14;B42D15/10;C08J7/00;C08J7/18;G03H1/02;G03H1/18;(IPC1-7):B05C1/08;G03F1/02 主分类号 G03F1/88
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