发明名称 PROCESS FOR PRODUCING SILICON SINGLE CRYSTAL
摘要 A method of manufacturing a silicon single crystal with the MCZ method in which the single crystal is pulled while being rotated under the conditions where the crystal growth rate v1 (mm min) and the crystal circumference velocity v2 (mm/min) satisfy the following relationships: <MATH> <MATH> <MATH> and <MATH> By the method, it is possible to manufacture a silicon single crystal with a large diameter with the MCZ method without causing distortion. <IMAGE>
申请公布号 EP0829561(A4) 申请公布日期 1999.06.02
申请号 EP19970907461 申请日期 1997.03.25
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 IINO, EIICHI;KIMURA, MASANORI;MURAOKA, SHOZO
分类号 C30B15/00;C30B15/20;C30B15/30;C30B29/06;H01L21/208 主分类号 C30B15/00
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