Mask blank and method of producing mask

摘要

A shading film (13) of chrome is formed entirely on one surface of a circular substrate (12) of quartz. The substrate (12) is rotated and resist is applied to the shading film (13). Since the substrate (12) is shaped in a circle, the resist spreads uniformly on the entire surface of the shading film (13) by the centrifugal force. Therefore, the resist has a substantially uniform film thickness over almost the entire surface of the shading film (13). This resist is patterned to form a resist pattern. By etching the shading film (13) with the resist pattern used as a mask, a pattern preferable in accuracy of dimensions can be formed.