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发明名称
METHOD FOR FORMING ELEMENT ISOLATION REGION IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100190010(B1)
申请公布日期
1999.06.01
申请号
KR19950069742
申请日期
1995.12.30
申请人
SAMSUNG ELECTRONICS CO, LTD.
发明人
KIM, CHANG-GU;KIM, JAE-DEOK
分类号
H01L21/76;H01L21/762;(IPC1-7):H01L21/76
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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