| 发明名称 |
Residue removal by supercritical fluids |
| 摘要 |
A method for the removal of residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to a supercritical fluid or liquid CO2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with either the supercritical fluid or liquid CO2.
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| 申请公布号 |
US5908510(A) |
申请公布日期 |
1999.06.01 |
| 申请号 |
US19960731538 |
申请日期 |
1996.10.16 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MCCULLOUGH, KENNETH JOHN;PURTELL, ROBERT JOSEPH;ROTHMAN, LAURA BETH;WU, JIN-JWANG |
| 分类号 |
H01L21/302;B08B7/00;H01L21/02;H01L21/304;H01L21/306;H01L21/3065;H01L21/311;H01L21/3213;(IPC1-7):C03C23/00 |
主分类号 |
H01L21/302 |
| 代理机构 |
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