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发明名称
SEMICONDUCTOR ELEMENT LAYOUT METHOD EMPLOYING PROCESS MIGRATION
摘要
申请公布号
KR100190182(B1)
申请公布日期
1999.06.01
申请号
KR19940028609
申请日期
1994.11.02
申请人
KABUSHIKI KAISHA TOSHIBA
发明人
MATSUMOTO, NOBU
分类号
H01L21/822;G06F17/50;H01L21/82;H01L27/04;(IPC1-7):H01L27/10
主分类号
H01L21/822
代理机构
代理人
主权项
地址
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