发明名称 |
Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof |
摘要 |
A photosensitive resin composition for forming light shielding films comprising a mixture of; 10 to 60 parts by weight of a high molecular weight polymeric binder; 15 to 50 parts by weight of a photopolymerizable monomer; 0.1 to 30 parts by weight of a photopolymerization initiator; and at least 20 parts by weight of a light shielding pigment comprising carbon black coated with resin for forming black matrices such as CRT displays and liquid crystal panels; a black matrix made from by said photosensitive resin composition; and a method for producing said black matrix comprising the steps of coating said photosensitive resin composition comprising a high molecular weight polymeric binder, a photopolymerizable monomer, a photopolymerization initiator, and a light shielding pigment consisting of carbon black coated with resin on a substrate, selectively radiating an activated beam, and developing the coating using an alkaline aqueous solution to form a pattern. The blackmatrix maintains high image contrast, and excels in electric insulation.
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申请公布号 |
US5908720(A) |
申请公布日期 |
1999.06.01 |
申请号 |
US19960730317 |
申请日期 |
1996.10.11 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
UCHIKAWA, KIYOSHI;SHIDA, MASARU;ONODERA, JUNICHI;KOMANO, HIROSHI |
分类号 |
G02F1/1335;G03F7/00;(IPC1-7):G03F9/00 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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