| 摘要 |
In the manufacture of a photoconductor for electrophotography, an aluminum substrate is heated at a temperature of 430 DEG C. to 550 DEG C. for three or more hours in such a manner that the admittance of an anodic oxidation film to be formed over the aluminum substrate is within a range of 0.4 to 30 S/m2 and the anodic oxidation film has a contact angle by pure water is restricted within a range of 30 DEG to 80 DEG , thus improving the heat resistance of the aluminum substrate. The resulting photoconductor for electrophotography has an adequate degree of heat resistance and can give a good image characteristic even in a high-temperature and high-humidity environment.
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