| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a washing method for a pellicle film of a mask or reticle capable of improving the workability of blow washing of the pellicle film, easily removing the foreign matter on the pellicle surface, protecting the pellicle film, decreasing the flow rates of air and gas and preventing the fresh adhesion of the foreign matter without requiring special skill. SOLUTION: The pellicle film 3 is resonated by sound waves, ultrasonic waves, pulse air, etc., and the foreign matter 4 is made easily removable from the pellicle surface by utilizing the reaction thereof. Since the pellicle film 3 is vibrated by its resonance frequency, the pellicle film 3 vibrates large even if the amt. of the gas for blow washing is small and, therefore, the foreign matter 4 is made easily separable from the pellicle surface and the easy removal of the foreign matter 4 is made possible.</p> |
