发明名称 HEAT TREATMENT DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a heat treatment device which holds the substrates of plural sizes and can carry out heat treatment. SOLUTION: Supporting pins 10a and 10b supporting the end parts of a substrate W1 having the diameter of 2000 mm and a substrate W2 having the diameter of 300 mm are erected on a supporting arm 15, so that they pass through a heating plate 11. A supporting pin 10b is fitted to a state where a supporting member 13b is locked to a relatively high position detached from the upper end of a pole 14b. The supporting pin 10b is fitted to a relative low state where the supporting member 13b is brought into contact with the upper end of the pole 14b. The substrate W1, or W2 can be transferred with a transportation arm entered from outside by raising/lowering the supporting arm 15.</p>
申请公布号 JPH11145149(A) 申请公布日期 1999.05.28
申请号 JP19970305608 申请日期 1997.11.07
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 OTANI MASAMI;TSUJI MASAO
分类号 C23C16/44;C23C16/458;H01L21/205;H01L21/31;H01L21/324;H01L21/68;H01L21/683;(IPC1-7):H01L21/324 主分类号 C23C16/44
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