| 摘要 |
<p>PROBLEM TO BE SOLVED: To inspect a mask pattern considering the delicate change of the pattern corner part of a real photomask. SOLUTION: Design data is developed to multilevel gradation pattern data by a multilevel gradation pattern development circuit 8, and further the corner part is rounded to be approximate to a real pattern in a corner rounding circuit 7. It is compared with measurement data in a defect decision circuit 6. The rounding circuit 7 is constituted of a corner detection circuit, a corner size judgement circuit for judging based on a corner rounding amount designated from the outside whether the size of the corner part is rounding processing feasible size or not, a rounding data generation circuit for generating rounding data based on the kind, the direction and the size of the corner part, and a rounding processing circuit for performing the rounding processing of the corner part of the multilevel gradation pattern data.</p> |
