| 摘要 |
PROBLEM TO BE SOLVED: To completely remove a side film while preventing corrosion. SOLUTION: There is provided with an ashing method wherein a resist pattern 4 is ashed after an aluminum film has been etched with a chlorine based gas, being masked by the resist pattern 4, in accordance with an aluminum wiring forming method. In the method, the surface portion of the resist pattern 4 is ashed half with an ashing gas in which a Freon based gas is added to oxygen. Subsequently, the resultant is subjected to corrosion protection rinsing using a weak acid solution. Thereafter, the remaining portion of the resist pattern 4 is fully ashed by using an ashing gas without containing a Freon based gas. Then, a side film 6 is removed by the weak acid solution. Thus, since the attachment of chloride 7 formed through etching is removed by half ashing and corrosion protection rising, a substrate 3 is not corroded by the chloride 7. Without forcibly raising the full ashing efficiency, the side film 6 can be completely removed through an exclusive removal rinsing. |
