| 摘要 |
PROBLEM TO BE SOLVED: To provide a distortion measurement method capable of accurately measuring the distortion of a reticule. SOLUTION: The plural marks 53 for distortion measurement of the reticule 5 mounted on the reticule stage 6 of an exposure device are successively irradiated with light, reflected light from the marks 53 for the distortion measurement is detected and the positions of the marks 53 for the distortion measurement are respectively surveyed. Further, from the surveyed values and the design positions on the reticule 5 of the respective marks 53 for the distortion measurement, the distortion of the reticule 5 is obtained. |
