| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist excellent in various properties such as resolving power, sensitivity, heat resistance, focus margin, exposure margin, adhesion, foaming margin, shelf stability and appliability and useful for microfabrication. SOLUTION: In a photosensitive resin compsn. contg. an alkali-soluble resin, a photosensitive compd. and a solvent, novolak resin made of a polycondensation product of a phenolic compd. and 1,3,5-trioxane is used as the alkali-soluble resin. |
