| 摘要 |
The present invention relates to a device and a method for holding substrates in microlithography, such as writing of, measuring of or printing from patterns on large flat substrates, in particular large-area photomasks for production of visual display devices such as TFT-LCD screens for portable computers. To the extent that other implements such as the display glass panels themselves, printed circuit boards or semiconductor reticles or wafers pose the same problem of maintaining the geometrical precision across several types of equipment, the invention can be applied there too. More specifically the invention relates to a device and a method for holding of substrates (3) in microlithography, comprising at least one pumping device (102) and a thereto connected control unit (103) adapted to provide for different pressures on different sides of the substrate (3), and to control the pressure difference to neutralize deflection of the substrate.
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